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Derniers dépôts
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Thibaut Meyer, Aurélie Girard, Christophe Cardinaud, Marek Bouška, Emeline Baudet, et al.. Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH 4 -H 2 -Ar plasmas. 25th International Symposium on Plasma Chemistry (ISPC25), May 2023, Kyoto, Japan. ⟨hal-04675793⟩
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T Meyer, A Girard, M Bouska, E Baudet, M Baillieul, et al.. Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH4-H2-Ar plasmas. 25th International Symposium on Plasma Chemistry (ISPC25), Takayuki Watanabe - Kyushu University; Satoshi Hamaguchi - Osaka University, May 2023, Kyoto, Japan. ⟨hal-04675788⟩
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S Chouteau, A Durocher-Jean, A Granier, M Richard-Plouet, L Stafford. Time-resolved analysis of Ar metastable and electron populations in low-pressure misty plasma processes using optical emission spectroscopy. Plasma Sources Science and Technology, 2024, 33 (7), pp.075016. ⟨10.1088/1361-6595/ad5d11⟩. ⟨hal-04672943⟩
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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Nombre de documents
82
Nombre de notices
294
Mots-clés
X-ray photoelectron spectroscopy
Chalcogenide
CNTs’ collapse
Copper
Mott insulator
SF 6
Anatase
C Photoelectron spectroscopy
TiO2
Biocapteurs
Buffer Couple
Kirkendall effect
Sol-gel
Optical waveguides
Plasma etching
Aryl-diazonium salts
Integrated optics
Scanning electron microscopy
Annealing
AuCu alloy
Capacitance
Carbon
Amyloid precursor
Bipolar resistive switching BRS
Atomic layer etching
Colloidal solution
Atomic force microscopy
Plasmas froids
Etching
Calcined clay
Biomasse
AZO thin films
Aluminium nitride
Avalanche breakdown
Carbon Nanotube
Alzheimer's disease
B1 Inorganic compounds
Ablation laser
Band alignment
Amorphous
CaTiO3Pr^3^+
Optical interferometry
Rutile
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
CHLORINE PLASMAS
Sputtering
A1 Characterization
Titanium dioxide
Semiconductors
Non-volatile memory
CIGSe
A Chalcogenides
B2 Quaternary
B2 Semiconducting indium compounds
A Thin films
Alloying
Nanocomposite
Applications industrielles
AlN
A-CNx
Spectroscopic ellipsometry
Selenization
Vanadium Sesquioxide
Transmission electron microscopy
Structure
3 nm in size
Biomembranes
Thin films
Low-pressure plasma processing
Residual stress
Thin film
PECVD
Physical vapor deposition
V2O3
Nanotubes
B2 Semiconducting alloys
Resistive switching
A3 Physical vapor deposition processes
X-ray diffraction
XPS
B Chemical synthesis
Films
A Multilayers
CH4
Band gap
Functionalization
Mass spectrometry
Biofilms microbiens
Mott insulators
Oxides
Optical properties
BOMBARDMENT
NEXAFS
Ambipolar material
Magnetron sputtering
TEM
Transfert d'énergie
Adsorption
B3 Solar cells
Bixbyite