GaN schottky diode on silicon substrate for high power THz multiplier - Université PSL (Paris Sciences & Lettres)
Communication Dans Un Congrès Année : 2021

GaN schottky diode on silicon substrate for high power THz multiplier

P Mondal
  • Fonction : Auteur
J Treuttel
  • Fonction : Auteur

Résumé

GaN-based planar Schottky barrier diodes with potential applications in THz frequency multipliers were fabricated on silicon substrate and characterized. GaN is a promising candidate to overcome all the physical limitations of GaAs which have been reached in the frame of high frequency power multiplier applications. Fabrication process of GaN Schottky diodes performed by e-beam is presented and DC characterizations are reported. Preliminary results on silicon showed a low breakdown voltage.
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Dates et versions

hal-03384345 , version 1 (18-10-2021)

Identifiants

  • HAL Id : hal-03384345 , version 1

Citer

Giuseppe Di Gioia, M Samnouni, H Bouillaud, P Mondal, J Treuttel, et al.. GaN schottky diode on silicon substrate for high power THz multiplier. WOCSDICE 2021, Jun 2021, Bristol, United Kingdom. ⟨hal-03384345⟩
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